100um Thin Glass and Fused Silica Wafer available

NQW has developing a process to produce 100um Thin Borofloat33 and Fused Silica Wafer, and the transfer into production is successful completed.

A special geometry at this 100um Thin Wafer are TTV < 10 microns, the double side polished surface roughness (Ra < 10 A) and different Dimensions (Square & Round) of the wafer presented a new challenge of our production capability at NQW site.

The so-called Thin glass & quartz material be used in the area of the sensors. By the knowledge which kind of customer requirement are relevant, the development time and the introduction as a standard product has shortened.

thin glass wafer held in hand

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